Intrinsic Properties and Future Perspective of HfO2/V2O5/HfO2 Multi-Layer Thin Films via E-Beam Evaporation as a Transparent Heat Mirror

HfO2 and V2O5 as multi-layer thin films are discussed for their potential use transparent heat mirrors. Multi-layered HfO2/V2O5/HfO2 with a thickness of 100/60/100 nm were prepared via e-beam evaporation on soda–lime glass substrate. Rutherford backscattering confirmed the structure uniform surface. The as-deposited annealed at 300 °C 400 °C, respectively, 1 h in air. transmittance approximately 90% was obtained all films. Due to relatively low non-stoichiometry HfO2, band gap 3.25 eV determined (instead theoretical 5.3–5.7 eV). possessed conductivity 0.2 Ω−1cm−1 increased 2 respectively. unique intrinsic properties films, results promising application mirror.